Developable resist overlayer composition as well as method for manufacturing resist overlayer pattern and resist pattern

A developable resist overlayer composition comprising a hydrocarbon compound (A) and a solvent (B),

• wherein,
• the hydrocarbon compound (A) is a compound represented by the formula (0) or a polymer comprising a structure derived from the compound represented by the formula (0) as a repeating unit;
• and
• the solvent (B) comprises a solvent (B1) represented by the formula (b1):
• wherein
• X is a C1-60 hydrocarbon group;
• n01 is a number of 1 to 10, n02 is a number of 0 to 10;
• Y is a group represented by the formula (1) or —OH, provided that 40 to 100% of the total number of Y is a group represented by the formula (1);
• R02 is C1-6 alkoxy (excluding t-butoxy), —(C═O)—R03, —(C═O)—O—
• R04, —(C═O)—N(R05)2, —O—(C═O)—R06 or —NR07—(C═O)—R08;
• R05 is H or C1-4 alkyl;
• R04 is C1-4 alkyl (excluding t-butyl);
• R06 is each independently H or C1-4 alkyl, and two R05 can be bonded each other to form a ring structure;
• R06 is H, C1-4 alkyl or C1-4 alkoxy (excluding t-butoxy);
• R07 is H or C1-4 alkyl;
• R08 is H, C1-4 alkyl or —N(R09)2;
• R07 and R08 can be bonded each other to form a ring structure when they are alkyl;
• and
• R09 is each independently H or C1-4 alkyl, and two R09 can be bonded each other to form a ring structure,
• wherein
• n11, n12, n13 and n14 are each independently a number of 0 to 1;
• L12 is selected from the group consisting of —C(═O)—, —CH2—C(═O)—, —C(═O)—CH2— and —CH(CH3)—;
• L14 is C1-5 alkylene;
• R15 is C1-15 alkyl or C2-7 alkenyl;
• and
• the methyl of L12 and the methyl of R15 may be bonded each other to form a ring structure, and
• R21—O—R22 (b1)
• wherein
• R21 and R22 are each independently C1-8 alkyl.