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US 2025/0084534 A1Published application
Method of depositing epitaxial material, structure formed using the method, and system for performing the method
AssigneeASM IP Holding B.V.
InventorsAmir Kajbafvala, Caleb Miskin
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Abstract
A method of depositing one or more epitaxial material layers, a device structure formed using the method and a system for performing the method are disclosed. Exemplary methods include coating a surface of a reaction chamber with a precoat material, processing a number of substrates, and then cleaning the reaction chamber.
Claims20
A method of depositing at least two epitaxial material layers, the method comprising the steps of:
- coating, via a pre-coating step, a surface of a reaction chamber of a reactor system with a precoat material;
- after the pre-coating step, sequentially performing, via two or more substrate processing steps, substrate processing without performing the pre-coating step in between the two or more substrate processing steps, each of the two or more substrate processing steps comprising:
- loading a substrate into the reaction chamber of the reactor system;
- depositing a first epitaxial material layer on a surface of the substrate;
- depositing a second epitaxial material layer on the first epitaxial material layer, wherein the second epitaxial material layer is different and distinct from the first epitaxial material layer;
- and
- unloading a processed substrate from the reaction chamber;
- after the two or more substrate processing steps, cleaning, via a cleaning step, the reaction chamber;
- and
- after the cleaning the reaction chamber, repeating the pre-coating step and the two or more substrate processing steps prior to repeating the cleaning step.
7 more elements
A method of depositing at least two epitaxial material layers, the method comprising the steps of:
- coating via a pre-coating step, a surface of a reaction chamber of a reactor system with a precoat material;
- after the pre-coating step, sequentially performing, via two or more substrate processing steps, substrate processing without performing the pre-coating step in between the two or more substrate processing steps, each of the two or more substrate processing steps comprising:
- loading a substrate into the reaction chamber of the reactor system;
- depositing an epitaxial material layer on a surface of the substrate;
- and
- unloading the substrate from the reaction chamber;
- after the two or more substrate processing steps, cleaning, via a cleaning step, the reaction chamber;
- and
- after the cleaning the reaction chamber, repeating the pre-coating step and the two or more substrate processing steps prior to repeating the cleaning step.
6 more elements
Dependencies are inferred from the claim text.