Hybrid depositing apparatus for gallium oxide and method for hybrid depositing using same

Abstract

The present disclosure relates to a hybrid deposition apparatus for gallium oxide, and a hybrid deposition apparatus for gallium oxide according to a disclosed embodiment of the present disclosure includes a gas supply assembly for supplying a source gas, a reaction gas, and a purge gas, a liquid supply assembly for supplying at least a portion of the source gas, and a chamber unit which is connected to the gas supply assembly and the liquid supply assembly and has a substrate disposed therein.

Dependencies are inferred from the claim text.