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US 2025/0084113 A1Published application
Nitrosyl precursors and related methods
AssigneeEntegris, Inc.
InventorsDavid M. Ermert, Philip S.H. Chen
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Abstract
Precursor compositions and related methods are provided. A precursor composition comprises a precursor compound of the formula: [(L1)nM(L2)m-n]z, where: L1 is a first ligand; M is a metal; L2 is a second ligand; n is 1 to 6; m is an oxidation state of M; and z is 1 or 2. A purity of the precursor compound in the composition is at least 99.5%. Methods for forming films and methods for making precursor compositions are provided.
Claims20
A composition comprising:
- a precursor compound of the formula:
- [(L1)nM(L2)m-n]z,
- where:
- L1 is a first ligand;
- M is a metal;
- L2 is a second ligand;
- n is 1 to 6;
- m is an oxidation state of M;
- and
- z is 1 or 2;
- wherein a purity of the precursor compound in the composition is at least 99.5%.
8 more elements
Dependencies are inferred from the claim text.