Use of copper-based coatings for crops under glass covers, antiphytopathogenic coating glass and the method of obtaining antiphytopathogenic coatings
AssigneeD.A.GLASS spolka z ograniczona odpowiedzialnoscia
InventorsPiotr Selwa, Przemyslaw Przemyslaw Zabek
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Abstract
A copper-based coatings that contain an additional element selected from titanium, zinc, and tin for cultivation under glass covers. In addition, an antiphytopathogenic coating glass for use as glass covers mainly in greenhouses for crops cultivation, as well as a method for producing coatings on a glass surface.
Claims14
A copper-based coatings for crops under glass covers comprising:
- titanium, zinc, or tin, and which are completed by oxygen from the obtained oxides, as antiphytopathogenic coatings
- the coating is use to eliminate phytopathogens such as:
- Pseudomonas syringae pv. tomato (IOR2146) and five fungal strains:
- Alternaria solani (IOR2046), Botrytis cinerea (IOR2235), Aspergillus fumigatus (KKP683), Fusarium oxysporum (IOR2129), Cladosporium fulvum (IOR824) Phytophthora infestans (IOR2276) belonging to the Chromista kingdom, the class Peronosporea.
An antiphytopathogenic coating glass having a glass pane with a sputtered coating,
- the sputtered coating containing:
- copper in the amount of 10-90% and one of:
- titanium in the amount of 0.5-15%,
- zinc in the amount of 3-28%,
- tin in the amount of 1-20%,
- wherein the sputtered coating content is completed by an oxygen arising from obtained in process oxides.
A method for obtaining antiphytopathogenic coatings on a glass pane surfaces, the method comprising the steps of:
- placing the glass pane surface on rollers of an feeder;
- transporting the glass pane surface to an initial vacuum chamber, wherein an initial vacuum is generated;
- transporting the lass pane surface of the orevious step to a process vacuum chamber;
- wherein the initial vacuum chamber has a preliminary vacuum of 1.0·10−1 Pa;
- wherein the process vacuum chamber produces a process vacuum of 1.1·10−1 to 7.6.10−2 Pa.;
- Nextly, the reactive gas of 100-900 cm3/min is dosed and the impulse DC power supply is switched on;
- Wherein the methotid runs with an electrical current intensity of 30-45 A, an effective power 4.5-8.7 kW, and a circulating power 1.1-4.5 kW in the magnetic field generated in the chamber;
- wherein a moving speed is set to 1.9-9.2 m/min and the glass pane surface transported through a first magnetron of the process chamber with a glowing plasma using at least a two-component target, wherein the first component is copper;
- wherein the method produces a transparent coating layer with a thickness of 10-60 nm.
Dependencies are inferred from the claim text.