Polishing pad

A polishing pad comprising a polishing layer having a circular polishing surface,

• wherein the polishing surface comprises a central region corresponding to a range of 0 to 10% of a radius of the polishing surface from a center of the polishing surface, and a peripheral edge region corresponding to a range of 90 to 100% of the radius of the polishing surface from the center of the polishing surface,
• the polishing layer comprises:
• at least one spiral groove or concentric grooves including a plurality of annular grooves arranged concentrically, the at least one spiral groove and the concentric grooves being disposed spanning from the central region to the peripheral edge region;
• and
• radial grooves including at least two line segment-shaped grooves extending from the central region toward the peripheral edge region,
• a center of the spiral groove, a center of the concentric grooves, and a center of the radial grooves are present in the central region,
• the line segment-shaped grooves have an average length of 30 to 65% of the radius of the polishing surface, and have a first end portion in a region at a distance of 5 to 10% of the radius of the polishing surface from the center of the radial grooves and a second end portion in a region at a distance of 35 to 70% of the radius of the polishing surface from the center of the radial grooves, and
• a cross-sectional area Sa (mm2), which is an average cross-sectional area of cross sections of the line segment-shaped grooves in a direction perpendicular to a length direction of the line segment-shaped grooves, and a cross-sectional area Sb (mm2), which is an average cross-sectional area of cross sections of the spiral groove or the concentric grooves in a direction perpendicular to a tangential direction of the spiral groove or the concentric grooves, satisfy 0.1≤Sb/Sa<1.0.