Semiconductor device and method of fabricating the same

A semiconductor device, comprising:

• a substrate;
• a plurality of data storage patterns on the substrate and spaced apart from each other in a first direction and a second direction, the first direction and the second direction intersecting each other and being parallel to a top surface of the substrate;
• a plurality of first cell conductive lines extending in the first direction and being spaced apart from each other in the second direction on the data storage patterns, each of the plurality of first cell conductive lines being connected to a corresponding column of data storage patterns that are spaced apart from each other in the first direction among the plurality of data storage patterns;
• a plurality of cell via contacts spaced apart from each other in the first direction and disposed between a pair of the plurality of first cell conductive lines;
• a plurality of dummy data storage patterns spaced apart from each other in the first direction and disposed between the pair of the plurality of first cell conductive lines, the plurality of dummy data storage patterns being interposed between the plurality of cell via contacts;
• and
• a plurality of upper conductive lines on the plurality of cell via contacts and electrically connected to the plurality of cell via contacts, respectively.