Pellicle for an euv lithography mask and a method of manufacturing thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTzu-Ang CHAO, Chao-Ching CHENG, Han WANG, Ming-Yang LI, Gregory Michael PITNER
Life of this patent
Estimating the term…
Abstract
A pellicle for an EUV photo mask includes a first layer, a second layer, and a main membrane disposed between the first layer and second layer. The main membrane includes a plurality of co-axial nanotubes, each of which includes an inner tube and one or more outer tubes surrounding the inner tube, and two of the inner tube and one or more outer tubes are made of different materials from each other.
Claims20
A pellicle for an extreme ultraviolet (EUV) reflective mask, comprising:
- a first layer;
- a second layer;
- and
- a main membrane disposed between the first layer and second layer, wherein:
- the main membrane includes a plurality of nanotubes, each of which includes an inner nanotube and first to N-th outer tubes each coaxially surrounding the inner nanotube, where N is a natural number from 1 to 10, and
- at least one of the first layer or the second layer includes a two-dimensional material in which one or more two-dimensional layers are stacked.
A method of manufacturing a pellicle for an extreme ultraviolet (EUV) reflective mask, comprising:
- forming a nanotube layer including a plurality of multiwall nanotubes;
- forming a pellicle frame over the nanotube layer;
- and
- forming a first cover layer and a second cover layer so that the nanotube layer is disposed between the first cover layer and the second cover layer, wherein:
- the multiwall nanotube includes an inner nanotube and one or more outer tubes, and
- at least one of the first cover layer and the second cover layer includes a two-dimensional material in which one or more two-dimensional layers are stacked.
A method of manufacturing a pellicle for an extreme ultraviolet (EUV) reflective mask, comprising:
- forming a nanotube layer including a plurality of nanotubes and flakes of one or more two-dimensional materials over a support substrate;
- forming a pellicle frame over the nanotube layer;
- cutting the nanotube layer to form a cut pellicle membrane;
- and
- forming a first cover layer and a second cover layer to encapsulate the cut pellicle membrane, wherein:
- the nanotube layer includes a network structure of a plurality of multiwall coaxial nanotubes, and
- at least two tubes of the plurality of multiwall coaxial nanotubes are made of different materials from each other.
Dependencies are inferred from the claim text.