Ferroelectric device or structure and a method for producing ferroelectric devices or structures
AssigneeEcole Polytechnique Federale De Lausanne (Epfl)
InventorsTobias KIPPENBERG, Zelin TAN, Rui WANG
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Abstract
The present invention concerns a method for producing at least one ferroelectric device or structure comprising the steps of providing at least one ferroelectric material or layer, or providing at least one ferroelectric material or layer to be patterned or structured; depositing at least one adhesion layer on a first side of the at least one ferroelectric material or layer; and depositing at least one diamond-like carbon layer or material on the at least one adhesion layer.
Claims21
1-64. (canceled)
A method for producing at least one ferroelectric device comprising:
- providing at least one ferroelectric material inclusive layer to be structured;
- depositing at least one adhesion layer on a first side of the at least one ferroelectric material inclusive layer;
- and
- depositing at least one diamond-like carbon inclusive layer on the at least one adhesion layer.
A method for producing at least one ferroelectric device comprising:
- providing at least one ferroelectric material inclusive layer to be structured;
- depositing at least one adhesion layer on a first side of the at least one ferroelectric material inclusive layer;
- and
- depositing at least one silicon carbon inclusive layer on the at least one adhesion layer.
A ferroelectric device comprising:
- at least one ferroelectric material inclusive layer,
- at least one adhesion layer on a first side of the at least one ferroelectric material inclusive layer;
- and
- at least one diamond-like carbon inclusive layer on the at least one adhesion layer.
Dependencies are inferred from the claim text.