Method to derive the location and size of oxide spacing area
AssigneeUnited Microelectronics Corp.
InventorsZih-Wun Peng, Chih-Yueh Li, Ya-Ching Cheng, Yu-Ying Hu, Da-Ching Liao, Po-Jen Hsiao
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AssigneeUnited Microelectronics Corp.
InventorsZih-Wun Peng, Chih-Yueh Li, Ya-Ching Cheng, Yu-Ying Hu, Da-Ching Liao, Po-Jen Hsiao
Estimating the term…
A method to derive the location and size of oxide spacing area is provided in the present invention, including steps of dividing a tested region into a plurality of grid units, each grid unit consists of a plurality of sub-grid units, calculating a pattern density difference, a minimum row/column pattern density and a row/column pattern density difference of every grid unit based on layout data, and determining a grid unit as where an oxide spacing area locates at when its pattern density difference is greater than a first predetermined value, its minimum row/column pattern density is less than a second predetermined value and its row/column pattern density difference is greater than a third predetermined value.
A method to derive the location and size of oxide spacing area, comprising:
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