Eco-friendly photoresist stripper composition
AssigneeSamyoung Pure Chemicals Co., Ltd.
InventorsSang Moon YUN, Chi Sung IHN, Jung Ig JEON, Hyuck Jae LEE
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Abstract
The present invention relates to an eco-friendly photoresist stripper composition and, more specifically, to an eco-friendly photoresist stripper composition including 20-50 wt % of a glycol ether, 1-10 wt % of a cyclic alcohol, 1-10 wt % of an inhibitor for preventing the corrosion of aluminum and copper, 0.5-10 wt % of an alkanolamine, 0.01-10 wt % of a reducing sulfur compound and the balance of water, thereby generating no toxic formaldehyde.
Claims8
An eco-friendly photoresist stripper composition comprising:
- 20 to 50 wt % of a glycol ether;
- 1 to 10 wt % of a cyclic alcohol;
- 1 to 10 wt % of an inhibitor preventing corrosion of aluminum and copper;
- 0.5 to 10 wt % of an alkanolamine;
- 0.01 to 10 wt % of a reducing sulfur compound;
- and
- the balance as water.
An eco-friendly photoresist stripper composition comprising:
- 30 wt % of diethylene glycol monobutyl ether;
- 4 wt % of benzyl alcohol;
- 3 wt % of xylitol;
- 0.2 wt % of pyrazole;
- 1 wt % of monoisopropyl alcoholamine;
- 0.9 wt % of sulfamic acid;
- and
- the balance as water.
Dependencies are inferred from the claim text.