Organotin photoresist composition and method of stabilization
OwnerFeng Luinventor
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Abstract
An organotin photoresist composition and a method of stabilization are described. The organotin photoresist composition comprises a (stannocenyl)tin compound, a solvent, and an additive. Stannocenyl includes bis(cyclopentadienyl)tin, or substituted bis(cyclopentadienyl)tin, wherein cyclopentadienyl comprises cyclopentadienyl C5H5 group, or substituted cyclopentadienyl C5H4R, C5H3R2, C5H2R3, C5HR4, or C5R5 group. A method of stabilization comprises the usage of organic molecules as additives to stabilize (stannocenyl)tin compound photoresists.
Claims20
An organotin compound as photoresist for actinic radiation containing stannocenyl group is represented by chemical formulas (1)-(50) as below:
- wherein R1, R2, R3 are each independently H, a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, E=O, S, Se, or Te, X=F, Cl, Br, or I, L is a substituted or unsubstituted alkyl, alkylene, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsaturated aryl group with 6-20 carbon atoms.
An organotin photoresist composition for photolithography patterning, comprising:
- a (stannocenyl)tin compound, a solvent, and an additive;
- wherein (stannocenyl)tin compound is one or more selected from the following:
- wherein R1, R2, R3 are each independently H, a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, E=O, S, Se, or Te, X=F, Cl, Br, or I;
- L is a substituted or unsubstituted alkyl, alkylene, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsaturated aryl group with 6-20 carbon atoms.
An organotin compound bearing stannocenyl group is represented by chemical formula as below:
- wherein R1, R2 are each independently substituted and unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or substituted and unsubstituted aryl group with 6-20 carbon atoms, E is O, S, Se, or Te.
Dependencies are inferred from the claim text.