Laser-based manufacturing processes and apparatuses
AssigneeWisconsin Alumni Research Foundation
InventorsScott Sanders, Lianyi Chen, Matthias Beuting
Life of this patent
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AssigneeWisconsin Alumni Research Foundation
InventorsScott Sanders, Lianyi Chen, Matthias Beuting
Estimating the term…
Aspects of the disclosure are directed to assessing characteristics of a target from which a vapor plume is generated. As may be implemented with various embodiments, energy (e.g., laser light, an electron beam) is applied to a target and a vapor plume is created therefrom. An interrogation laser is applied toward the target via the vapor plume, and backscattered light from the interrogation laser is detected. The backscattered light is used to detect absorption characteristics of the vapor plume. Energy is further applied to the target, in which the applied energy is adjusted based on the absorption characteristics. Such approaches facilitate the application of energy to a target for a variety of uses.
A method comprising:
An apparatus comprising:
Dependencies are inferred from the claim text.