Generation on ok model by multiple concepts

A method for detecting faulty manufactured items, the method comprises:

• obtaining an evaluated manufactured item (MI) image;
• segmenting the image of the evaluated MI to provide different groups of evaluated MI patches, wherein evaluated MI patches of the different groups of evaluated MI patches differ from each other by one or more evaluated MI patch generation attribute;
• generating evaluated MI patches representations (EMIPRs) for the evaluated MI patches of the different groups of evaluated MI patches;
• matching the EMIPRs to reference MI patches representations (RMIPRs) of reference MI patches, to provide comparison results;
• wherein the reference MI patches are selected from reference MI patches candidates, based on at least one of (a) a popularity of reference MI patch candidates representations or (b) feedback from a person;
• wherein reference MI patches of the different groups of reference MI patches differ from each other by one or more reference MI patch attribute;
• and
• determining a state of the evaluated manufactured item based on the comparison results.