Thermal control systems, models, and manufacturing processes in lithography

A non-transitory computer-readable medium storing computer program instructions that, when executed by one or more processors, are configured to cause the one or more processors to at least:

• receive wavefront data representing a wavefront provided by an optical projection system of a semiconductor processing apparatus;
• determine wavefront drift based on a comparison of the wavefront data and target wavefront data;
• and
• determine, based on the wavefront drift, one or more process parameters, wherein the one or more process parameters comprises one or more parameters associated with a thermal device, wherein the thermal device is configured to provide thermal energy to the optical projection system during operation.