Arrangement, method and computer program product for calibrating facet mirrors

Abstract

An arrangement (100), a method and a computer program product for system-integrated calibration of facet mirrors (18, 19) of a microlithographic illumination system (20). Beam paths (103) between a radiation source (101) and a radiation detector (102) are created by the facet mirrors (18, 19), with respectively only one pivotable micromirror (18″, 19″) of each facet mirror (18, 19) affecting said beam path. By methodically pivoting one of the micromirrors (18″, 19″) affecting the beam path (10), it is possible, based on the radiation detector (102), to find a specific optimal pivot position, the underlying orientation of the micromirror (18″, 19″) of which can also be calculated geometrically. By comparing the calculated orientation with the orientation ascertained by a tilt sensor on the micromirror (18″, 19″), it is possible to calibrate the tilt sensor or micromirror (18″, 19″) of the facet mirror (18, 19).

Dependencies are inferred from the claim text.