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US 2025/0028236 A1Published application
Hardmask composition, hardmask layer, and method of forming patterns
AssigneeSamsung SDI Co., Ltd.
InventorsYounhee NAM, Yushin PARK, Seunghyun KIM, Seulgi JEONG, Sangchol PARK, Minji SO, Jooyoung CHUNG
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Abstract
A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using the hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent,
Claims18
A hardmask composition, comprising:
- a polymer including a structural unit represented by Chemical Formula 1;
- and
- a solvent:
- wherein, in Chemical Formula 1,
- A is a substituted or unsubstituted C6 to C30 aromatic hydrocarbon group,
- X1 and X2 are each independently a single bond, —C(═O)—, a substituted or unsubstituted C1 to C30 alkylene group, or a combination thereof,
- Y is a substituted or unsubstituted C2 to C30 alkenylene group or a substituted or unsubstituted C2 to C30 alkynylene group, and
- is a linking point.
5 more elements
Dependencies are inferred from the claim text.