Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Method For Manufacturing Compound For Forming Metal-Containing Film, And Patterning Process

A method for manufacturing a compound (A) for forming a metal-containing film, the method comprising

• allowing one or more selected from the group consisting of a hydrolysate of only a metal compound represented by the following formula (A-1), a condensate of only a metal compound represented by the following formula (A-1), and a hydrolysis condensate of only a metal compound represented by the following formula (A-1) to react with an organic compound represented by the following formula (1) or
• hydrolyzing, condensing, or hydrolysis-condensing a metal compound represented by the following general formula (A-2),
• M(OR1A)4 (A-1)
• R2ACOXCOOH (1)
• wherein M represents Ti, Zr, or Hf;
• R1A represents a monovalent organic group having 1 to 20 carbon atoms;
• R2A represents a divalent organic group having 2 to 20 carbon atoms and containing at least one crosslinking group represented by any of the following general formulae (a-1) to (a-4);
• and X represents a divalent organic group having 2 to 20 carbon atoms,
• wherein Ra represents a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms;
• “q” represents 0 or 1;
• and “*” represents an attachment point,
• (R2ACOXCOO)xM(OR1A)y (A-2)
• wherein M represents Ti, Zr, or Hf;
• R1A represents a monovalent organic group having 1 to 20 carbon atoms;
• R2A represents a divalent organic group having 2 to 20 carbon atoms and containing at least one crosslinking group represented by any of the general formulae (a-1) to (a-4);
• X represents a divalent organic group having 2 to 20 carbon atoms;
• x+y=4;
• and “x” and “y” each represent an integer of 1 or more.