Gas production apparatus, gas production system, and gas production method
AssigneeSekisui Chemical Co., Ltd.
InventorsMasaki NAKAMURA, Yuki NAKAMA, Tsuyoshi TONO
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AssigneeSekisui Chemical Co., Ltd.
InventorsMasaki NAKAMURA, Yuki NAKAMA, Tsuyoshi TONO
Estimating the term…
Provided are a gas production apparatus (that is, an industrially advantageous gas production apparatus), a gas production system, and a gas production method that can easily and accurately determine the timing to end a reaction and can operate stably. A gas production apparatus 1 includes: reactors 4a and 4b each of which includes a container 41 through which a substrate gas is capable of passing and a reducing agent layer (packed bed) 42 with which the container 41 is filled and which includes a metal oxide that exchanges oxygen elements with the substrate gas by an exothermic reaction or an endothermic reaction; and a plurality of temperature sensors 4T1 to 4T4 that are connected to each of the reactors 4a and 4b and measure temperatures of a plurality of measurement points of the packed bed 42 along a passage direction of the substrate gas, respectively. When a length of the packed bed 42 along the passage direction of the substrate gas is H, an interval between adjacent measurement points is equal to or less than H/3.
A gas production apparatus comprising:
A gas production method comprising:
Dependencies are inferred from the claim text.