System including heating means and actinic radiation source and a method of using the same
AssigneeCanon Kabushiki Kaisha
InventorsTimothy Brian STACHOWIAK, Fen Wan, Weijun Liu
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AssigneeCanon Kabushiki Kaisha
InventorsTimothy Brian STACHOWIAK, Fen Wan, Weijun Liu
Estimating the term…
A system can include a heating means for heating a photocurable composition over a substrate; an actinic radiation source configured to emit actinic radiation at a wavelength less than 700 nm; and a controller configured to determine a targeted temperature to be produced by the first heating means to achieve a photocuring temperature of the photocurable composition when the photocurable composition is exposed by the actinic radiation source, wherein the photocuring temperature is greater than an ambient temperature. A method can include dispensing the photocurable composition over a substrate; photocuring a layer of the photocurable composition at a photocuring temperature higher than ambient temperature to form a cured layer; and baking the cured layer to form a baked layer. The system and method can allow a thickness change of layer to be 0% or closer to 0%.
A system, comprising:
A method, comprising:
A system, comprising:
Dependencies are inferred from the claim text.