Vacuum processing system, apparatus and method for transporting a thin film substrate

Abstract

An apparatus for transportation of a thin film substrate under vacuum conditions is described. The apparatus for transportation includes a rotatable roller with a substrate facing surface including a first substrate facing surface portion, wherein the substrate facing surface includes one or more gas outlets, wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region and at least one non-deposition region. The apparatus further includes a gas distribution for providing the gas flow through the one or more gas outlets into an interspace between the thin film substrate and the first substrate facing surface portion, and a sealing belt conveyor system including one or more sealing belts provided at the at least one non-deposition region.

Dependencies are inferred from the claim text.