Back to results
US 2024/0407079 A1Published application
Carrier structure
AssigneeSiliconware Precision Industries Co., Ltd.
InventorsChien-Sheng CHEN, Chia-Chu LAI, Ho-Chuan LIN
Life of this patent
Estimating the term…
Abstract
A carrier structure is provided, in which a ground layer is formed on a dielectric body, a circuit layer is formed in the dielectric body, and a conductive via is formed in the dielectric body and electrically connected to the circuit layer and the ground layer, where the ground layer has at least one first groove that exposes a surface of the dielectric body, so that the noise of the circuit layer is easy to spread out of the dielectric body, so as to prevent the problem of crosstalk from occurring in the circuit layer.
Claims10
A carrier structure, comprising:
- a dielectric body;
- a ground layer formed on the dielectric body and having at least one first groove exposing a portion of a surface of the dielectric body;
- a circuit layer formed in the dielectric body, wherein the circuit layer includes at least one guard line and at least one signal line;
- and
- a conductive via formed in the dielectric body and electrically connected to the circuit layer and the ground layer, wherein the conductive via is connected to the guard line and free from being connected to the signal line.
2 more elements
Dependencies are inferred from the claim text.