Bifacial solar cell and preparation method therefor

A method for preparing a bifacial solar cell, characterized by comprising following steps:

• providing a silicon wafer with a silicon oxide doped layer disposed on one side and a first crystalline silicon doped layer disposed on one side, and depositing an intrinsic silicon film on a surface of the silicon oxide doped layer using a silicon source as a raw material;
• bombarding the intrinsic silicon film by a plasma gas, and repeating a process of depositing the intrinsic silicon film and a process of bombarding the intrinsic silicon film with the plasma gas for 0 to 50 times to form an intrinsic silicon layer, wherein repeating for 0 times is that the method comprises one process of depositing the intrinsic silicon film and one process of bombarding the intrinsic silicon film by the plasma gas;
• and
• depositing a second crystalline silicon doped layer on a surface of the intrinsic silicon layer by using a silicon source and a second doping source as a raw material,
• wherein the silicon wafer is N-type, the second crystalline silicon doped layer is N-type, and the first crystalline silicon doped layer is P-type;
• or, the silicon wafer is P-type, the second crystalline silicon doped layer is P-type, and the first crystalline silicon doped layer is N-type.