Substrate processing apparatus

A substrate processing apparatus comprising:

• a rotating mechanism configured to hold a circular substrate in a horizontal posture and rotates the substrate about a vertical axis passing through a center of the substrate;
• and
• a nozzle mechanism including a nozzle body, a support and a position adjuster, the nozzle body being arranged below the substrate and having a discharge port from which a processing liquid is discharged toward a lower surface peripheral edge part of the substrate, the support being configured to support the nozzle body in a manner that makes the position of the discharge port changeable in a radial direction of the substrate, the position adjuster being configured to adjust the position of the discharge port by moving the nozzle body relative to the support, wherein
• the support and the position adjuster are arranged internal to a virtual arc centered on the vertical axis and passing through the discharge port.