Multi-layer solid-state devices and methods for forming the same

A method of forming a multi-layer solid-state device, the method comprising:

• (A1) depositing at least a portion of a first electrode over a first surface of a substrate using a first shadow mask in a first position with respect to the substrate;
• (E1) after (A1), displacing at least one of the substrate and the first shadow mask with respect to the other of the substrate and the first shadow mask, such that the first shadow mask is in a second position with respect to the substrate, and depositing a first intervening layer over the first electrode using the first shadow mask in the second position, the first position being offset from the second position in at least one dimension in plan view;
• (C1) after (E1), displacing at least one of the substrate and the first shadow mask with respect to the other of the substrate and the first shadow mask, such that the first shadow mask is in a third position with respect to the substrate, and depositing at least a portion of a second electrode over the first intervening layer using the first shadow mask in the third position, the second position being offset from the third position in at least one dimension in plan view;
• (E2) after (C1), displacing at least one of the substrate and the first shadow mask with respect to the other of the substrate and the first shadow mask, such that the first shadow mask is in a fourth position with respect to the substrate, and depositing a second intervening layer over the second electrode using the first shadow mask in the fourth position, the fourth position being aligned with the second position in plan view;
• and
• (A2) after (E2), displacing at least one of the substrate and the first shadow mask with respect to the other of the substrate and the first shadow mask, such that the first shadow mask is in a fifth position with respect to the substrate, and depositing at least a portion of a third electrode over the second intervening layer using the first shadow mask in the fifth position, the fifth position being aligned with the first position in plan view,
• wherein at least a portion of the first surface is non-planar.