Self-aligned build-up processing

A method of microfabrication, the method comprising:

• receiving a substrate having features formed within a first layer such that a top surface of the substrate has the features uncovered and the first layer uncovered;
• depositing a first solubility-shifting agent on the substrate, the first solubility-shifting agent selected so that the first solubility-shifting agent adheres to uncovered surfaces of the features without adhering to uncovered surfaces of the first layer;
• depositing a second solubility-shifting agent on the substrate, the second solubility-shifting agent selected so that the second solubility-shifting agent adheres to the uncovered surfaces of the first layer without adhering to uncovered surfaces of the features;
• depositing a first photoresist on the substrate;
• activating the first solubility-shifting agent sufficient to cause regions of the first photoresist above the features to become soluble to a particular developer;
• activating the second solubility-shifting agent such that the second solubility-shifting agent increases insolubility of the first photoresist above the first layer;
• developing the first photoresist resulting in a relief pattern that defines openings that uncover the features;
• and
• executing a selective growth process that grows a selective-deposition material on the features and within the defined openings of the relief pattern resulting in self-aligned selective deposition features.