Back to results
US 2024/0404806 A1Published application
Method for Magnetron Sputtering
AssigneeMelec Co., Ltd.
InventorsGünter Mark, Jonathan Löffler
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeMelec Co., Ltd.
InventorsGünter Mark, Jonathan Löffler
Estimating the term…
The invention relates to a method for depositing layers on a substrate by means of magnetron sputtering in a deposition chamber with use of at least one magnetron, to which an electrical supply voltage comprising three superimposed electrical excitation forms is applied. The latter comprise a first excitation form, which is formed by a high-frequency voltage with a frequency of 1 MHz to 10 GHZ, a second excitation form in the form of high-power impulses (HIPIMS) with a frequency of 100 Hz to 5 kHz, and a third excitation form, formed by a pulsed d.c. voltage or medium-frequency a.c. voltage with a frequency of between 10 kHz and 100 KHz.
A method for depositing layers on a substrate by magnetron sputtering in a deposition chamber with use of at least one magnetron, to which an electrical supply voltage comprising three superimposed electrical excitation forms is applied, comprising a first excitation form, which is formed by a high frequency voltage with a frequency of 1 MHz to 10 GHZ, a second excitation form in the form of high-power impulses with a frequency of 100 Hz to 5 kHz, and a third excitation form, formed by a pulsed d.c. voltage or a.c. voltage with a frequency of between 10 kHz and 100 kHz.
A magnetron sputtering unit for depositing layers on a substrate, comprising a deposition chamber, a substrate holder, and at least one magnetron arranged in the deposition chamber, which is connected to at least one power supply, whose output emits three excitation forms to the at least one magnetron, comprising a first excitation form that is formed by a high-frequency voltage with a frequency of 1 MHz to 10 GHz, a second excitation form that is formed by high-power impulses with a frequency of 100 Hz to 5 kHz, and a third excitation form that is formed by a pulsed d.c. voltage or a.c. voltage with a frequency of between 10 kHz and 100 kHz.
Dependencies are inferred from the claim text.