Plasma treatment apparatus

Abstract

A plasma treatment apparatus includes a plasma treatment chamber in which a treated base material is accommodated, a conveyance part which conveys the treated base material into the plasma treatment chamber, an inductive coupling linear antenna configured to generate plasma, a bias electrode which modules a plasma potential, and a heating part which heats the treated base material. A cross section of the bias electrode cut perpendicularly to a longitudinal direction has a dome-shaped or U-shaped box shape, and the inductive coupling linear antenna and the heating part are disposed substantially in parallel in the bias electrode in the longitudinal direction of the bias electrode.

Dependencies are inferred from the claim text.