Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsSaki KATO, Koji ICHIKAWA
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AssigneeSumitomo Chemical Company, Limited
InventorsSaki KATO, Koji ICHIKAWA
Estimating the term…
Disclosed are a resist composition comprising an acid generator including a salt represented by formula (I), and a crosslinking agent: wherein X represents S or I; R1, R2 and R3 each represent a hydroxy group, —X2—R10, etc.; X2 represents *—CO—O—, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1, A2 and A3 each represent a hydrocarbon group; Ar1, Ar2 and Ar3 each represent an aromatic or heterocyclic aromatic hydrocarbon group; m10 represents 0 or 1, and when X is S, m10 is 1, and when X is I, m10 is 0; m1 to m3 and m7 to m9 represent an integer of 0 to 5, m4 to m6 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, at least one of m1 to m3 and m7 to m9 represent an integer of 1 or more, and when m1 to m3=0, at least one of one or more R7 to R9 represent a hydroxy group, —X2—R10, etc.; and AI− represents an organic anion.
A resist composition comprising an acid generator including a salt represented by formula (I), and a crosslinking agent:
Dependencies are inferred from the claim text.