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US 2024/0393703 A1Published application
Holding apparatus, lithography apparatus, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKOHEI IMOTO
Life of this patent
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Abstract
A holding apparatus includes a holding unit configured to hold an object, a phase change material arranged in the holding unit or on a holding surface for the object, which undergoes phase change between an amorphous phase and a crystalline phase and changes in volume with the phase change, and a control unit configured to control heating of the phase change material using a heating unit configured to heat the phase change material so as to deform the holding surface by causing volume change of the phase change material.
Claims23
A holding apparatus comprising:
- a holding unit configured to hold an object;
- a phase change material arranged in the holding unit or on a holding surface for the object, which undergoes phase change between an amorphous phase and a crystalline phase and changes in volume with the phase change;
- and
- a control unit configured to control heating of the phase change material using a heating unit configured to heat the phase change material so as to deform the holding surface by causing volume change of the phase change material.
1 more element
Dependencies are inferred from the claim text.