Substrate processing apparatus, substrate processing method and article manufacturing method

A substrate processing apparatus for performing a process of a substrate, comprising:

• a substrate stage configured to hold a substrate when the process is performed;
• a temperature control mechanism configured to hold a substrate to be conveyed to the substrate stage and perform temperature control to a predetermined temperature;
• a conveyance mechanism configured to convey a substrate in the apparatus;
• and
• a control unit configured to control conveyance of a substrate in the apparatus,
• wherein
• when a first time required to convey, by the conveyance mechanism, a first substrate having undergone temperature control by the temperature control mechanism from the temperature control mechanism to a supply position where a substrate is supplied to the substrate stage becomes not less than a second time required to drive the substrate stage holding a second substrate, on which the process is being performed prior to the first substrate, to the supply position via a collection position where the processed substrate is collected, the control unit starts conveyance of the first substrate from the temperature control mechanism to the substrate stage by the conveyance mechanism, and
• when a waiting time until the first substrate conveyed to the supply position is supplied to the substrate stage exceeds an upper limit time set in advance, the control unit conveys the first substrate from the supply position to the temperature control mechanism by the conveyance mechanism.