Germanium photodetector embedded in a multi-mode interferometer
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWeiwei Song, Stefan Rusu, Chewn-Pu Jou, Huan-Neng Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWeiwei Song, Stefan Rusu, Chewn-Pu Jou, Huan-Neng Chen
Estimating the term…
A method includes etching a silicon layer to form a silicon slab and an upper silicon region over the silicon slab, and implanting the silicon slab and the upper silicon region to form a p-type region, an n-type region, and an intrinsic region between the p-type region and the n-type region. The method further includes etching the p-type region, the n-type region, and the intrinsic region to form a trench. The remaining portions of the upper silicon region form a Multi-Mode Interferometer (MMI) region. An epitaxy process is performed to grow a germanium region in the trench. Electrical connections are made to connect to the p-type region and the n-type region.
A device comprising:
A device comprising:
A device comprising:
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