Additive for chemical mechanical polishing, method for producing the same, and polishing liquid composition
AssigneeToagosei Co., Ltd.
InventorsSachiko IMURA, Akitsugu SHIBATA, Akihiro GOTOU, Shinya KANBE
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AssigneeToagosei Co., Ltd.
InventorsSachiko IMURA, Akitsugu SHIBATA, Akihiro GOTOU, Shinya KANBE
Estimating the term…
An additive is configured to be used for chemical mechanical polishing, and contains a polymer. The polymer contains a structural unit (A) derived from a vinyl monomer having a -(LO)n-R group, and a total content of the structural unit derived from a monomer containing one or more functional groups selected from the group consisting of a carboxylic acid group, a phosphoric acid group, a phosphonic acid group, a sulfuric acid group, a sulfonic acid group, and salts thereof is 0 to 0.6 mass % in polymer. The polymer has a dispersity represented by weight average molecular weight (Mw)/number average molecular weight (Mn) of 2.0 or less, wherein L represents an alkylene group having 4 or less carbon atoms, n represents an arbitrary integer of 3 to 150, and R represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 4 carbon atoms.
An additive for chemical mechanical polishing comprising a polymer (P),
A method for producing an additive for a chemical mechanical polishing liquid, the additive containing a polymer, comprising;
Dependencies are inferred from the claim text.