Resist composition, resist pattern forming method, compound, and acid diffusion control agent

A resist composition that generates an acid upon exposure and exhibits changed solubility in a developing solution under an action of the acid, the resist composition comprising:

• a base material component (A) that exhibits changed solubility in a developing solution under the action of the acid;
• and
• an acid diffusion control agent component (D) that controls diffusion of the acid generated upon exposure,
• wherein the acid diffusion control agent component (D) contains a compound (D0) represented by General Formula (d0),
• wherein Rd0 represents a condensed cyclic group in which an aromatic ring and an alicyclic ring are condensed, the alicyclic ring in the condensed cyclic group has a substituent, where at least one of the substituents includes a hydrocarbon group having a bromine atom or a hydrocarbon group having an iodine atom, Yd0 represents a divalent linking group or a single bond, provided that Yd0 is bonded to the alicyclic ring in the condensed cyclic group, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or morel.