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AssigneeTokyo Electron Limited
InventorsTakuya MIURA, Kouichirou TANAKA, Shogo TAKAHASHI, Yusuke MIYAKUBO, Kentaro YOSHIHARA
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A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, includes a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate, wherein the first discharge port is formed so as to extend in a first direction along the surface, and wherein a width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.
1-15. (canceled)
A liquid treatment method comprising:
A non-transitory computer-readable storage medium storing a computer program configured to control a substrate apparatus that supplies a gas, while maintaining a state in which a treatment liquid remains on a substrate, from above the treatment liquid to at least a region relatively further inward than a peripheral edge portion of an upper surface of the treatment liquid remaining on the substrate, so that the gas is diffused in a radial direction rather than a circumferential direction of the substrate.
Dependencies are inferred from the claim text.