Greenhouse glazing

2:

• The greenhouse glazing of claim 1, wherein a first dielectric layer is deposited on the first surface between the transparent conductive oxide and the first surface.

3:

• The greenhouse glazing of claim 2, wherein the first dielectric layer is a titanium oxide layer and has a thickness between 5 and 25 nm.

4:

• The greenhouse glazing of claim 1, wherein a first dielectric coating laver and a second dielectric coating layer are deposited between the first surface of the glass substrate and the transparent conductive oxide, and the first dielectric layer is deposited directly on the first surface.

5:

• The greenhouse glazing of claim 4, wherein the first dielectric layer is a titanium oxide layer and has a thickness between 5 and 25 nm, and the second dielectric layer is deposited over the first dielectric layer and has a thickness between 10 and 40 nm.

6:

• The greenhouse glazing of claim 1, wherein the transparent conductive oxide is a doped tin oxide, the doping agent being fluor or antimony.

7:

• The greenhouse glazing of claim 1, wherein the transparent conductive oxide has a thickness between 150 and 500 nm.

8:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by a parameter Sa being at least 0.05 μm.

9:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by a parameter Sz being at least 1 μm.

10:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by the roughness parameter Rsm being 50 μm.

11:

• The greenhouse glazing of claim 1, wherein each of the nano-porous silica layers deposited on the first surface or the second surface of the glass substrate has a refractive index of at most 1.5.

12:

• The greenhouse glazing of claim 1, wherein an emissivity is smaller than 0.20.

13:

• The greenhouse glazing of claim 1, having a durability of a class A glazing conform to a norm EN1096-2 2012E.

14:

• The greenhouse glazing of claim 1, wherein each of the nano-porous silica layers deposited on the first surface or the second surface of the glass substrate has a thickness between 100 and 120 nm.

15:

• The greenhouse glazing of claim 4, wherein the first dielectric layer is a titanium oxide layer having a thickness between 8 and 15 nm, the second dielectric layer is deposited over the first dielectric layer, and the second dielectric layer is a silicon oxide layer having a thickness between 10 and 40 nm.

16:

• The greenhouse glazing of claim 1, wherein the transparent conductive oxide has a thickness between 170 and 360 nm.

17:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by a parameter Sa being 0.10-10 μm.

18:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by a parameter Sz being 2-12 μm.

19:

• The greenhouse glazing of claim 1, wherein a roughness of the second surface is characterized by a roughness parameter Rsm being 55 μm to 140 μm.

20:

• The greenhouse glazing of claim 1, wherein an emissivity is smaller than 0.16.