Surface processing method for dental implant

Abstract

Disclosed is a surface processing method for a dental implant, the surface processing method including: (a) laser-processing a surface of an implant; (b) etching the laser-processed surface of the implant; and (c) washing the etched implant, wherein a macro surface including one or more first grooves is formed at the surface of the implant by step (a), a micro surface including one or more second grooves is formed at the surface of the implant by step (b), an outer circumferential surface of the implant includes a top portion and a bottom portion, and at least one of an average width and an average depth of the first grooves is formed to be greater at the top portion of the outer circumferential surface of the implant than at the bottom portion of the outer circumferential surface of the implant.

Dependencies are inferred from the claim text.