Laser processing apparatus and processing method thereof

A laser processing apparatus configured for processing multiple targets at a substrate and comprising:

• a first axis;
• a second axis intersecting the first axis;
• a laser generator configured to provide a laser beam;
• a stage being movable and configured to carry the substrate;
• a galvo mirror module configured to deflect the laser beam and having a scanning range along the second axis;
• a focusing lens module configured for focusing the laser beam;
• and
• a controller coupled to the laser generator, the stage, and the galvo mirror module and including
• an arithmetic logic unit configured for stratifying said multiple targets into multiple beam path layers according to the scanning range of the galvo mirror module along the second axis, each beam path layer including multiple said targets;
• wherein
• the stage is controlled by the controller to repeatedly move along the first axis forwardly and backwardly at a constant velocity, wherein a forward movement is defined as a movement of the stage moving along the first axis forwardly and a backward movement is defined as a movement of the stage moving along the first axis backwardly;
• during each forward movement or each backward movement of the stage moving along the first axis at the constant velocity, the laser generator and the galvo mirror module are controlled by the controller according to a respective one of the beam path layers, wherein a time interval and a spaced interval between each consecutive two of the targets of each beam path layer are determined by the arithmetic logic unit according to the constant velocity of the stage moving along the first axis;
• the laser generator is controlled by the controller according to the time interval to shoot the laser beam and the galvo mirror module is controlled by the controller according to the spaced interval to deflect the laser beam within the time interval to adjust a focusing position of the laser beam at the substrate.