Frustrated lewis pair-impregnated porous materials and uses thereof
AssigneeUniversity of South Florida
InventorsShengqian MA, Zheng NIU
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Abstract
Described herein are compositions composed of frustrated Lewis pairs impregnated in porous materials such as, for example, metal-organic frameworks, and their uses thereof. These compositions may allow new applications of frustrated Lewis pairs in catalysis by sequestering and protecting the frustrated Lewis pair within the nanospace of the porous material. Also provided are methods of hydrogenating an organic compound having at least one unsaturated functional group comprising using the compositions described herein.
Claims29
A composition comprising:
- a porous material having at least one nanospace comprising a porous metal-organic framework (MOF) or a porous organic polymer (POP);
- and
- a frustrated Lewis pair comprising a Lewis base and a Lewis acid;
- wherein the frustrated Lewis pair is contained within at least one nanospace of the porous material.
2-6. (canceled)
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A composition comprising:
- a porous material having at least one nanospace comprising a porous metal-organic framework (MOF), the metal-organic framework comprising one or more metal ions and one or more organic linker ligands, the one or more metal ions selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, Al, Ga, In, TI, Si, Ge, Sn, Pb, As, Sb, and Bi, and combinations thereof, and the one or more organic linker ligands being selected from the group consisting of a polycarboxylate ligand, a polypyridyl ligand, a polycyano ligand, a polyphosphate ligand, a polyhydroxyl ligand, a polysulfonate ligand, a polyimidazolate ligand, a polytriazolate ligand, a polytetrazolate ligand, and a polypyrazolate ligand, and combinations thereof;
- and
- a frustrated Lewis pair comprising a Lewis base and a Lewis acid, wherein the Lewis acid is a compound of Formula I:
- wherein:
- L is a group 13 element;
- X1 and X2 are each independently selected from alkyl, cycloalkyl, aryl, or heteroaryl, each of which may be optionally substituted with at least one substituent selected from cyano, halo, hydroxyl, nitro, mesityl, substituted mesityl, alkyl, cycloalkyl, alkoxy, phenyl, alkylphenyl, heterocyclyl, alkylheterocyclyl, SOzaryl, or SOzalkyl;
- and
- X3 is selected from hydrogen, halogen, alkyl, cycloalkyl, aryl, or heteroaryl, each of which except for hydrogen and halogen may be optionally substituted with at least one substituent selected from cyano, halo, hydroxyl, nitro, mesityl, substituted mesityl, alkyl, cycloalkyl, alkoxy, phenyl, alkylphenyl, heterocyclyl, alkylheterocyclyl, SOzaryl, or SOzalkyl, and wherein the Lewis base is a compound of Formula IV:
- wherein:
- R4, R5, and R6 are each independently selected at each occurrence from amino, cyano, halo, nitro, trifluoromethyl, C1-6 alkyl, aryl, C1-4 alkoxy, —S(C1-6 alkyl), —S(O)(C1-4 alkyl), and —S(O)2(C1-6 alkyl);
- and
- m is 0, 1, 2, or 3, and
- wherein the frustrated Lewis pair is contained within at least one nanospace of the porous material.
Dependencies are inferred from the claim text.