Susceptor

Abstract

There is provided a susceptor for a film deposition apparatus or for an etching apparatus, including a ceramic plate including a first surface on which a wafer is to be placed, and a second surface opposed to the first surface, and embedded with an internal electrode; a cylindrical ceramic shaft attached to the second surface of the ceramic plate; a gas supply hole penetrating through the ceramic plate and the ceramic shaft to extend from the first surface of the ceramic plate to a distal end of the ceramic shaft away from the ceramic plate through the second surface; and a porous plug embedded in a portion of the gas supply hole corresponding to at least the ceramic plate.

Dependencies are inferred from the claim text.