Plasma processing apparatus and substrate support body

A plasma processing apparatus, comprising:

• a plasma processing chamber;
• a base support disposed within the plasma processing chamber;
• a base having a first through hole penetrating from an upper surface of the base to a lower surface of the base and disposed on an upper portion of the base support;
• an electrostatic chuck having a second through hole communicating with the first through hole by penetrating from a substrate support surface or a ring support surface to a lower surface of the electrostatic chuck and disposed on an upper portion of the base;
• a first insulating member having a cylindrical shape and disposed within the first through hole;
• a second insulating member having a cylindrical shape and disposed within the first through hole to surround at least a portion of the first insulating member;
• a first sealing member disposed between the first insulating member and the electrostatic chuck;
• and
• a second sealing member disposed between the first insulating member and an insulating support member disposed within the base support.