Thermal treatment apparatus and thermal treatment method

A thermal treatment method of performing a heat treatment on a substrate using a thermal treatment apparatus,

• the thermal treatment apparatus comprising:
• a hot plate on which the substrate is mounted and which is configured to heat the mounted substrate;
• an upper cover configured to cover a treatment space above the hot plate and form an opening being a carry-in/out port for the substrate to/from the treatment space;
• and
• an exhauster provided at a position opposite to the opening across the hot plate in plan view and configured to exhaust gas from the treatment space,
• the thermal treatment method comprising heating the substrate in the treatment space while exhausting gas by the exhauster, wherein
• in the heating,
• a shutter for the opening is brought into a closed state and a lower portion of the opening is covered with the shutter, and
• gas flowing into the treatment space from an upper portion of the opening due to the exhaust of gas by the exhauster is divided into an upper side and a lower side by a gas flow guide provided at a position spaced apart from the shutter.