Electrostatic Chuck Having Extended Lifetime
AssigneeApplied Materials, Inc.
InventorMitsutoshi FUKADA
Life of this patent
Estimating the term…
Abstract
Embodiments of substrate supports for use in process chambers are provided herein. In some embodiments, a substrate support includes: an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches; and one or more chucking electrodes disposed in the ESC.
Claims20
A substrate support, comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches;
- and
- one or more chucking electrodes disposed in the ESC.
A substrate support, comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC between the plurality of mesas, wherein the ESC includes a plurality of backside gas openings extending through the ESC along two or more rings and terminating within at least some of the plurality of trenches;
- and
- one or more chucking electrodes disposed in the ESC.
A process chamber, comprising:
- a chamber body defining an interior volume therein;
- and
- a substrate support disposed in the interior volume, the substrate support comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches, and one or more chucking electrodes disposed in the ESC.
Dependencies are inferred from the claim text.