Plasma generating device
AssigneeAtonarp Inc.
InventorNaoki TAKAHASHI
Life of this patent
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Abstract
A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
Claims13
(canceled)
A gas analyzer apparatus configured to analyze a sampling gas supplied from a process chamber in which one or more plasma processes are carried out, the gas analyzer comprising:
- a sample chamber which is equipped with a dielectric wall structure and into which the sampling gas flows;
- an RF supplying mechanism that is configured to generate the plasma inside the sample chamber using an electric field or a magnetic field through the dielectric wall structure;
- and
- a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the sample chamber and configured to control a potential of the plasma in the sample chamber independently of the process chamber.
A method for monitoring one or more plasma processes to be carried out in a process chamber using a gas analyzer apparatus that is configured to analyze a sampling gas supplied from the process chamber, wherein the gas analyzer comprises:
- a sample chamber into which the sampling gas flows;
- an RF supplying mechanism that is configured to generate the plasma inside the sample chamber using an electric field or a magnetic field through a dielectric wall structure of the sample chamber;
- and
- a first electrode disposed along an inner surface of the sample chamber,
- the method comprises controlling a potential of the plasma in the sample chamber independently of the process chamber using the first electrode.
Dependencies are inferred from the claim text.