Polymer, leveling agent and preparation method thereof, electroplating solution, and electroplating method
AssigneeHuawei Technologies Co., Ltd.
InventorsLi ZHENG, Jiye LUO, Baizhao TAN
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AssigneeHuawei Technologies Co., Ltd.
InventorsLi ZHENG, Jiye LUO, Baizhao TAN
Estimating the term…
This application discloses a polymer, a leveling agent, and preparation methods thereof, an electroplating solution, and an electroplating method, and pertains to the field of electroplating technologies. The polymer includes a plurality of repeating units, and the repeating unit includes: a binary epoxy compound residual group and a nitrogen-containing group. The binary epoxy compound residual group is a residue formed after an epoxy bond of a binary epoxy compound is ring-opened. The nitrogen-containing group includes: an alkyl group, and a dimethylamine group and a nitrogen-containing heterocyclic group that are respectively connected to two ends of the alkyl group, where the dimethylamine group is further connected to the binary epoxy compound residual group through a single bond. The polymer is conducive to obtaining a high-coplanarity plating at a high current density, and is especially suitable for being used as a leveling agent in an electroplating solution.
A polymer comprising a plurality of repeating units, each of the plurality of repeating units comprising:
A polymer preparation method comprising:
The use of a polymer in preparation of a leveling agent, wherein the polymer comprises a plurality of repeating units, and each of the plurality of repeating units comprises:
An electroplating solution comprising:
Dependencies are inferred from the claim text.