Display device and manufacturing method thereof

A manufacturing method of a display device, including:

• forming a lower electrode;
• forming a rib which covers at least part of the lower electrode;
• forming a partition on the rib, the partition including a conductive bottom portion, a stem portion located on the bottom portion and a top portion located on the stem portion;
• forming an organic layer which covers the lower electrode and emits light based on application of voltage;
• forming an upper electrode which covers the organic layer and is in contact with the bottom portion;
• and
• forming a sealing layer which continuously covers the partition and a thin film including the organic layer and the upper electrode and has a thickness less than or equal to 1.5 μm, wherein
• the forming the partition includes:
• forming a first layer having a thickness greater than or equal to 50 nm using a molybdenum-tungsten alloy;
• forming a second layer on the first layer, the second layer comprising an upper surface in which a height from a lower surface of the first layer is less than or equal to 500 nm;
• forming a third layer on the second layer;
• forming a resist on the third layer;
• forming the top portion by removing a portion of the third layer exposed from the resist;
• forming the stem portion by removing a portion of the second layer exposed from the top portion and by decreasing a width of the second layer which remains under the top portion so as to be less than a width of the top portion;
• and
• forming the bottom portion by removing a portion of the first layer exposed from the stem portion.