Radiation-emitting semiconductor chip and method for manufacturing a radiation-emitting semiconductor chip

A radiation-emitting semiconductor chip comprising:

• a first doped region;
• an active region adjacent to the first doped region, the active region configured to generate electromagnetic radiation;
• and
• a second doped region arranged on a side of the active region facing away from the first doped region,
• wherein the first doped region is structured in a step-like manner and comprises several planes in a direction perpendicular to a main extension plane of the radiation-emitting semiconductor chip, and
• wherein the active region covers the first doped region on a side surface and a top surface.

A method for manufacturing a radiation-emitting semiconductor chip, the method comprising:

• providing a substrate;
• depositing a first doped region;
• structuring the first doped region such that the first doped region is structured in a step-like manner and tapers along a direction away from the substrate and comprises several planes;
• depositing an active region such that the active region covers a side surface of the first doped region;
• and
• depositing a second doped region on the active region.

A radiation-emitting semiconductor chip comprising:

• a first doped region;
• an active region adjacent to the first doped region, the active region configured to generate electromagnetic radiation;
• and
• a second doped region arranged on a side of the active region facing away from the first doped region,
• wherein the first doped region is structured in a step-like manner and comprises several planes in a direction perpendicular to a main extension plane of the radiation-emitting semiconductor chip,
• wherein the active region covers the first doped region on a side surface and a top surface, and
• wherein the first doped region comprises a three-dimensional shape, the shape of the first doped region being approximated to a shape of a step pyramid.