Thin Film Transistor, Manufacturing Method Thereof and Display Apparatus Comprising the Same

A manufacturing method of a thin film transistor, the manufacturing method comprising:

• forming a first oxide semiconductor material layer on a substrate;
• forming a second oxide semiconductor material layer on the first oxide semiconductor material layer;
• and
• forming an active layer by patterning the first oxide semiconductor material layer and the second oxide semiconductor material layer;
• wherein the active layer includes:
• a first oxide semiconductor layer formed by patterning the first oxide semiconductor material layer;
• and
• a second oxide semiconductor layer formed by patterning the second oxide semiconductor material layer,
• wherein the first oxide semiconductor layer has an amorphous structure, and the second oxide semiconductor layer has a crystalline structure.