Substrate processing apparatus, substrate processing system, and data processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsTakashi OTA, Hideji NAOHARA, Takashi IKEUCHI, Tetsuya HIRAOKA
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AssigneeSCREEN Holdings Co., Ltd.
InventorsTakashi OTA, Hideji NAOHARA, Takashi IKEUCHI, Tetsuya HIRAOKA
Estimating the term…
A substrate processing apparatus, a substrate processing system, and a data processing method are provided. A substrate processing apparatus (100) includes a thickness gauge (8), a controller (102), and storage (103). The thickness gauge (8) measures the thickness of an object (TG) included in a substrate (W). The controller (102) enters input data in a trained model (LM), thereby causing the trained model (LM) to output processing conditions. The storage (103) stores reference data (RE) acquired based on pieces of training data (LD) used to construct the trained model (LM). The controller (102) acquires pre-processing measurement data indicating the thickness of the object (TG) before the substrate processing is performed, and creates input data based on target data indicating a target value for the thickness of the object (TG) and the pre-processing measurement data. The controller (102) compares the input data and the reference data (RE) to determine whether or not to perform the substrate processing.
A substrate processing apparatus that performs substrate processing that is processing of a substrate, comprising:
A substrate processing system that comprises a thickness gauge apparatus that measures thickness of an object included in a substrate and a substrate processing apparatus that performs substrate processing, which is processing of the substrate, after the thickness gauge apparatus measures the thickness of the object, the substrate processing apparatus including:
A substrate processing system comprising:
A data processing method, comprising:
Dependencies are inferred from the claim text.