Apparatus for treating substrate

A substrate treating apparatus comprising:

• an ion blocker which captures an ion included in a plasma;
• and
• a support unit disposed at a bottom side of the ion blocker and configured to support a substrate, and
• wherein the ion blocker is made of a dielectric substance.

A substrate treating apparatus comprising:

• a chamber having an inner space;
• an ion blocker dividing the inner space into a first space at a bottom side and a second space at a top side;
• a support unit configured to support a substrate at the first space;
• and
• a gas supply unit configured to supply a gas excited to a plasma at the second space;
• a plasma source generating the plasma at the first space and/or the second space;
• and
• a heating source passing through the ion blocker and transmitting a heat source to a substrate supported on the support unit, and
• wherein the ion blocker is formed of a dielectric substance, and
• a plurality of passages are formed at the ion blocker for flowing a fluid, and
• an ion among an ion and a radical included in the plasma are captured while passing through the passage, and
• the heating source passes through the ion blocker to be transmitted to the substrate supported on the support unit.